Diffusion Bonded Crystals with High Damage Threshold

The Rhomboid prism application for rhomboid-prism is controlling and redirecting the optical path without affecting the image direction. They can be used to displace an optical center line for light beam folding and stereoscopic systems of different sizes.

Fused silica window, with low thermal expansion,  providing stability and resistance to thermal shock over large temperature excursions, wide thermal operating range and high laser damage threshold, is a better choice for transmission from UV to IR.

Laser Protect Windows(Laser protective glass, protective filters or welding protective windows) are used to save for the high cost of laser optics.

HGO is a company has skillful workers with wide processing experiences and skillful processing technique. Thus we also offer processing service such as oriented, cutting, grinding, polishing ,repolishing, coating ,recoating and diffusion bonding etc. Customers are very welcome to contact with us for further information.

The dichroic mirror is a mirror with significantly different reflection or transmission properties at two different wavelengths, it’s characterized by almost complete transmission of light at certain wavelengths and almost complete reflection of light at other wavelengths. It can be widely used in Laser technology applications.

Plano-concave rectangular cylindrical lenses provide uni- axial negative imaging for anamorphic beam expansion and a wide range of applications.These lenses may also be used as mirror blanks if a concave cylindrical surface mirror is required.

Silicon is used as an optical window primarily in the 3 to 5 micron band and as a subsrate for production of optical filters and windows.     Silicon (Si) is grown by Czochralski pulling techniques (CZ) and contains some oxygen that causes an absorption band at 9 microns. To avoid this, material can be prepared by a Float-Zone (FZ) process. Optical silicon is generally lightly doped (5 to 40 ohm cm) for best transmission above 10 microns, and doping is usually boron (P-type) and phosphorus (N-type). After doping silicon has a further pass band: 30 to 100 microns which is effective only in very high resistivity uncompensated material.    

Cr4+:YAG (Y3Al5O12) crystal is ideal for passive Q-switch operation of Nd:YAG and other Nd3+ or Yb3+ doped laser crystals in the wavelength range of 900 nm to 1200 nm. Passive Q-switches or saturable absorbers provide high power laser pulses without electro-optic Q-switches, thereby reducing the package size and eliminating a high voltage power supply. A remarkable feature of Cr4+:YAG is the high damage threshold of >10 J/cm2@1064 nm, 10 ns. Its absorption band extends from 900 nm to 1200 nm and peaks around 1060 nm with a very large absorption cross-section.